CO2Clean

The CO2Clean Gun of Dry Ice Cleaning

Removes Contaminants as Small as 0.1 Micron and Hydrocarbon Contamination

The CO2Clean Gun of dry ice cleaning is an effective way to remove particle and hydrocarbon contamination, instrument, silicon wafer, fiber optics, mirrors, hybrid circuit, …etc. It is available for those need novel precise cleaning on. The CO2Clean Gun can clean organic contamination and particles smaller than 0.1 micron by an impinging stream of solid CO₂ particles. 

Future microcircuits will have smaller feature sizes and more complexity, and will require more processing steps. Therefore, in order to keep economical yield, contamination control and processing environment must be significantly improved and wafer cleaning procedure must be developed.

Before                                                                    After

Remove organic contamination