CO2Clean

              

        

CO2Clean Surface Cleaning

The small soft dry ice particles generated by the CO2Clean Gun can immediately penetrate the boundary layer near a surface creating more thorough cleaning than with nitrogen or air guns.

         

The organic contaminants are removed by a localized solvent action created when dry ice particles impinge on the surface.

  

CO2Clean Dry ice will not scratch the most delicate surfaces. It does not damage wafer in nano-circuits.

  

The wafer surface marked with red oil ink can be easily cleaned by the CO2Clean Gun.

  

The particle contaminations are removed by momentum transfer of the solid CO2 which overcome the adhesive forces or the Van der Waals force on the surface.

 

The CO2 is non-conductive allowing electronic components to be cleaned. The CO2Clean removes both particles and organic based residues, particles of all sizes can be cleaned and the smallest one can be removed about 0.1~0.03 microns.